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P384 – 2″ UHV sputter deposition University Bielefeld

Application

UHV sputter deposition system for thin film and multilayer deposition at 2″ substrates

Year of delivery

2014

Installation site

University Bielefeld, Germany

Design Features

  • UHV magnetron sputter deposition system with confocal sputter up configuration.
  • Up to four 2″ magnetrons with manual in situ tilting.
    • All magnetrons with easy changeable magnetic system for use with ferromagentic or non-ferromagnetic target materials.
  • Fully motorized 2 axes sample manipulator with integrated sample shutter, DC Bias potential option and maximal sample temperature well above 800°C.
  • Moveable thickness monitor for sputter rate measurement before starting a deposition process.
  • Integrated bake out system.
  • Load lock chamber with storage and lamp heating option.

Special Features

  • System is prepared to be added to a cluster tool via second transfer port at load lock chamber.
  • Different sample sizes from 2″ wafer down to 10mm x 10mm samples can be handled (using different kind of sample adapters).

Outer Dimensions

Technical specifications and performance values

General

Sputtering chamber

Size

400 mm diameter, about 710 mm height

Material

stainless steel

Load lock chamber

Size

150 mm diameter, about 300 mm height

Material

stainless steel

Vacuum

Sputtering chamber

Base pressure

< 2 *10-9 mbar

Pump down time

1.25 hours to < 10-7 mbar

Chamber pumping

Turbo pumping stage, chamber lid differentially pumped by dry foreline pump

Bake out

< 150°C

Load lock chamber

Base pressure

< 10-7 mbar

Pump down time

3/4 hours to < 10-6 mbar

Chamber pumping

Turbo pumping stage with dry foreline pump

Manipulator features

Sputtering chamber

Sample size

diameter max. 2″ substrate

Motion axes

2 motorized axes (manipulator z translation and (continous) rotation of the sample stage)

Pneumatic sample shutter (part of the manipulator head)

Temperatures

Room temperature (not stabilized) up to 950°C at sample

Special features

DC bias potential option

Load lock chamber

(Sample storage)

Storage size

6 sample holders

Sample size

diameter max. 2″ substrate

Motion axes

2 manual axes (rotation, z tranlsation)

Rotation axis equipped with an air side idexer plate for easy and fast sample loading via access door or transfer rod

Performance test results

Chamber pump down
Long time sample heating